Tao Zhong, Jinyan Du, Yuhao Hu, Yang Shen, Haoze Yuan, Jianing Song, Junchang Guo, Wenmao Li, Zhengrong Lin, Boru Wei, Yujie Zhao, Yonghao Zheng, Chunhua Cui, Xu Deng. “The ethanol illusion: hidden peroxides as a source of radical artifacts.” ChemRxiv (). https://doi.org/10.26434/chemrxiv.15007834/v1

Values presented only in colorimetric-assay, UV–visible-absorption, fluorescence-microscopy, EPR, or XPS plots or images were not transcribed

Commercial ethanol samples
S-H, Sigma-Aldrich Corporation, HPLC, colorimetry Peroxide concentration 406.85 μM; standard deviation 13.87
E-H, Energy Chemical, HPLC, colorimetry Peroxide concentration 372.88 μM; standard deviation 14.71
K-H, KNOWLES, HPLC, fluorescence Peroxide concentration 0.901 μM; standard deviation 0.047
K-E, KNOWLES, EL, colorimetry Peroxide concentration 62.25 μM; standard deviation 5.95
K-A, KNOWLES, AR, fluorescence Peroxide concentration 1.279 μM; standard deviation 0.079
J-H, Jinshan Chemical, HPLC, fluorescence Peroxide concentration ~; standard deviation ~
C-A, Chron Chemical, AR, colorimetry Peroxide concentration 75.89 μM; standard deviation 5.98
G-G, General Reagent, GR, fluorescence Peroxide concentration 0.156 μM; standard deviation 0.034
G-E, General Reagent, EL, fluorescence Peroxide concentration ~; standard deviation ~
A-H, Aladdin, HPLC, colorimetry Peroxide concentration 31.14 μM; standard deviation 3.53
KC-H, Kermel Chemical, HPLC, fluorescence Peroxide concentration 0.632 μM; standard deviation 0.044
KC-E, Kermel Chemical, EL, fluorescence Peroxide concentration 0.370 μM; standard deviation 0.041
M-E, Macklin, EL, colorimetry Peroxide concentration 16.14 μM; standard deviation 3.01
MT-H, Mreda Technology, HPLC, fluorescence Peroxide concentration 0.559 μM; standard deviation 0.039
Main, p. 6
Peroxide-containing ethanol
Ti(IV) sulfate colorimetry, evaporation Concentrating 2 mL of ethanol to 200 μL resulted in a peroxide concentration as high as 3.26 mM
Ti(IV) sulfate colorimetry, heating At 65 °C in the presence of oxygen, the peroxide concentration increased monotonically over time, reaching an increment of 111 μM within one week
EPR, S-H ethanol evaporation residue After dropping S-H ethanol onto a glass substrate and allowing it to stand for 15 min, a robust characteristic four-line (1:2:2:1) DMPO-OH signal emerged
EPR, ethanol–water solution A freshly prepared 25 % (v/v) ethanol–water solution exhibited co-existing DMPO-OH and DMPO-R signals; standing for 3 days or heating at 45 °C significantly increased signal intensity
EPR, FeSO₄ addition Introducing 200 μM FeSO₄ solution into peroxide-containing ethanol in a 1:1 ratio caused immediate intense ·OH and ·R signals; HO₂· signals were detected within 5 min, and all three radical-adduct intensities increased over 15 min
EPR, K-E ethanol At a peroxide concentration of 62.22 μM, heating and Fe²⁺ addition yielded analogous signals with lower intensities; no EPR signals were detected under these conditions with peroxide-free ethanol
EPR, 5 % (v/v) ethanol–water mixture DMPO-OH and DMPO-R signals were observed after Fe²⁺ addition
Main, pp. 5, 8–9
Silicon wafer surfaces after ethanol cleaning
XPS, control O 1s Peaks at approximately 531.7, 532.7, and 533.8 eV
XPS, residue-covered O 1s Peaks shifted to 531.2 and 533.3 eV with markedly increased intensities; the peak at 532.5 eV decreased slightly; a Na KLL Auger peak emerged at 536 eV
XPS, residue-covered C 1s Signals at 284.8 eV and 288.6 eV increased significantly
XPS, residue-covered Si 2p The signal was markedly attenuated